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ZrO2 and HfO2 Thin Films from Cyclopentadienyl Precursors by Atomic Layer Deposition

Peer-reviewed
Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri
-2003Publications information icon

Cyclopentadienyl-type precursors for atomic layer deposition of thin films

Peer-reviewed
Putkonen, Matti; Niinistö, Lauri
University of Helsinki2004Publications information icon

Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-type Compounds and Water as Precursors

Peer-reviewed
Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri
Chemistry of Materials2004Publications information icon

Organometallic precursors for atomic layer deposition

Peer-reviewed
Putkonen, Matti; Niinistö, Lauri
-2005Publications information icon

Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films

Peer-reviewed
Niinistö, Jaakko; Kukli, Kaupo; Tamm, Aile; Putkonen, Matti; Dezelah IV, Charles L.; Niinistö, Lauri...
Journal of Materials Chemistry2008Publications information icon

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Peer-reviewed
Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Stoll, Sarah; Kukli, Kaupo; Sajavaara, Timo; Rit...
Journal of Materials Chemistry2005Publications information icon

Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

Peer-reviewed
DOI
10.1002/cvde.201407116
Blanquart, Timothee; Kaipio, Mikko; Niinistö, Jaakko; Gavagnin, Marco; Longo, Valentino; Blanquart, ...
Chemical Vapor Deposition2014Publications information icon

Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films

Peer-reviewed
DOI
10.1021/cm2030735
Niinisto, Jaakko; Hatanpää, Timo Tapio; Kariniemi, Maarit; Mäntymäki, Miia; Costelle, Leila; Mizohat...
Chemistry of Materials2012Publications information icon

Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

Peer-reviewed
Niinistö, J.; Putkonen, M.; Niinistö, Lauri; Song, F.; Williams, P.; Heys, P.N.; Odedra, R.
Chemistry of Materials2007Publications information icon

MHD characteristics of ELMs and their precursors

Maraschek, M.; Gunter, S.; Kass, T.; Saarelma, S.; Zehrfeld, H.; Zohm, H.
-1998

ZrO2 and HfO2 Thin Films from Cyclopentadienyl Precursors by Atomic Layer Deposition

Peer-reviewed
2003

Cyclopentadienyl-type precursors for atomic layer deposition of thin films

Peer-reviewed
2004

Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-type Compounds and Water as Precursors

Peer-reviewed
2004

Organometallic precursors for atomic layer deposition

Peer-reviewed
2005

Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films

Peer-reviewed
2008

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Peer-reviewed
2005

Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

Peer-reviewed
DOI
10.1002/cvde.201407116
2014

Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films

Peer-reviewed
DOI
10.1021/cm2030735
2012

Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

Peer-reviewed
2007

MHD characteristics of ELMs and their precursors

1998